Editorial Board
Editors-in-Chief

Huanli Dong
Institute of Chemistry, Chinese Academy of Sciences, China

Xue Feng
Tsinghua University, China
Advisors

Yunqi Liu
Institute of Chemistry, Chinese Academy of Sciences, China

Xiaodong Chen
Nanyang Technological University, Singapore

Antonio Facchetti
Georgia Institute of Technology, USA

Wenping Hu
Tianjin University, China

Norbert Koch
Humboldt-Universitat zu Berlin, Germany

Chwee Teck Lim
National University of Singapore, Singapore

Paolo Samorì
University of Strasbourg, France

Henning Sirringhaus
University of Cambridge, UK
Associate Editors

Guozhen Shen
Beijing Institute of Technology, China

Yunlong Guo
Institute of Chemistry, Chinese Academy of Sciences, China

Shuzhou Li
Nanyang Technological University, Singapore

Unyong Jeong
Pohang University of Science and Technology, Korea

Panče Naumov
New York University Abu Dhabi, UAE; New York University, USA
Editorial Board Members

Paddy Chan
The University of Hong Kong, China

Jun Chen
University of California, Los Angeles, USA

Wenlong Cheng
The University of Sydney, Australia

Alex Chortos
Purdue University, USA

Chong-an Di
Institute of Chemistry, Chinese Academy of Sciences, China

Michael Dickey
North Carolina State University, USA

Sam Emaminejad
University of California, Los Angeles, USA

Zhiyong Fan
The Hong Kong University of Science and Technology, China

Kenjiro Fukuda
RIKEN, Japan

Ziyi Ge
Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, China

Chuanfei Guo
Southern University of Science and Technology, China

Feng He
Southern University of Science and Technology, China

Jia Huang
Tongji University, China

Lang Jiang
Hebei University of Technology, China

Do Hwan Kim
Hanyang University, Korea

Hanying Li
Zhejiang University, China

Liqiang Li
Tianjin University, China

Jun Liu
Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, China

Naoji Matsuhisa
The University of Tokyo, Japan

Ebinazar B. Namdas
The University of Queensland, Australia

Caofeng Pan
Beihang University, China

Lijia Pan
Nanjing University, China

Young Min Song
Gwangju Institute of Science and Technology, Korea

Dongming Sun
Institute of Metal Research, Chinese Academy of Sciences, China

Jun Takeya
The University of Tokyo, Japan

Qingxin Tang
Northeast Normal University, China

Sihong Wang
The University of Chicago, USA

Chuan Wang
The Washington University, USA

Binghao Wang
Southeast University, China

Zhongming Wei
Institute of Semiconductors, Chinese Academy of Sciences, China

Xiaomin Xu
Tsinghua University, China

Feng Yan
The Hong Kong Polytechnic University, China

Tomoyuki Yokota
The University of Tokyo, Japan

Xinge Yu
City University of Hong Kong, China

Cunjiang Yu
The Pennsylvania State University, USA

Jingbi You
Institute of Semiconductors, Chinese Academy of Sciences, China

Yingying Zhang
Tsinghua University, China
Managing Editors

Can Gao
Institute of Chemistry, Chinese Academy of Sciences, China

Qiang Zhao
Civil Aviation University of China, China